紅外窄帶濾光片采用多膜系結(jié)構(gòu)，通過(guò)精密鍍膜工藝制備的只允許特定波長(zhǎng)、特定帶寬的光線透過(guò)的濾光片，主要用于紅外氣體檢測(cè)、熒光分析等領(lǐng)域。
精密鍍膜工藝制備
紅外窄帶濾光片采用多膜系結(jié)構(gòu)，通過(guò)精密鍍膜工藝制備
保證特定氣種的檢測(cè)精度
多膜系結(jié)構(gòu)，保證特定帶寬、波長(zhǎng)光線通過(guò)，保證特定氣種的檢測(cè)精度
Specifications
Description | 5020NBP-240 |
Center Wavelength | 5020±40nm |
Half-peak Width | 240±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 4480BPF-620 |
Center Wavelength | 4480±70nm |
Half-peak Width | 620±60nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 3900NBP-138 |
Center Wavelength | 3900±50nm |
Half-peak Width | 138±15nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 4260NBP-180 |
Center Wavelength | 4260±40nm |
Half-peak Width | 180±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 3400NBP-180 |
Center Wavelength | 3400±50nm |
Half-peak Width | 180±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 10600NBP-240 |
Center Wavelength | 10600±100nm |
Half-peak Width | 240±50nm |
Peak transmittance | ≥70% |
Blocking | 2000-18000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
